2014年

  • Daisuke Hirose, Tatsuya Shimoda, Evaluating the state of indium-tin oxide gels via estimation of their cohesive energy, Japan. J. Appl. Phys. 53 (2014) 02BC01.
  • Takashi Masuda, Zhongrong Shen, Hideyuki Takagishi, Keisuke Ohdaira, and Tatsuya Shimoda, Amorphous silicon carbide films prepared using vaporized silicon ink. Japan. J. Appl. Phys. 53 (2014) 031304.
  • Hiroko Murayama, Tatsushi Ohyama, Akira Terakawa, Hideyuki Takagishi, Takashi Masuda, Keisuke Ohdaira, and Tatsuya Shimoda, Development of a-Si solar cells using "Liquid-Si Printing", Can. J. Phys. 92 (2014) 928.
  • Tatsuya Shimda and Takashi Masuda, Liquid silicon and its application for electronics, Japan. J. Appl. Phys. 53 (2014) 05FM06.
  • Yoo Sakuma, Keisuke Ohdaira, Takashi Masuda, Hideyuki Takagishi, Zhongrong Shen, and Tatsuya Shimoda, Effect of Annealing and Hydrogen Radical Treatment on the Structure of Solution-Processed Hydrogenated Amorphous Silicon Films, Japan. J. Appl. Phys. 53 (2014) 04ER07.
  • Hiroko Murayama, Tatsushi Ohyama, Akira Terakawa, Hideyuki Takagishi, Takashi Masuda, Keisuke Ohdaira, and Tatsuya Shimoda, Effects of catalytic-generated atomic Hydrogen treatment on a-Si fabricated by "Liquid-Si Printing", Japan. J. Appl. Phys. 53 (2014) 05FM06.
  • Hiroaki Koyama, Kazuhiko Fukada, Yoshitaka Murakami, Satoshi Inoue, Tatsuya Shimoda, Investigation of Roll-to-Sheet Imprinting for the Fabrication of Thin-film Transistor Electrodes, IEICE Trans. Electron,E-97C (2014) 1042.
  • Vu Nam Luong, Yoshiaki Ukita, Yuzuru Takamura, Tadaoki Mitani, Tatsuya Shimoda, Thi My Dung Dang, Mau Chien Dang,Solution processing of microcavity for BioMEMS application, Adv. Nat. Sci.: Nanosci. Nanotechnol. 5 (2014) 035003.
  • Ryo Kawajiri, Hideyuki Takagishi, Yasuo Matsuki, Tadaoki Mitani, Tatsuya Shimoda, Formation of epitaxial cobalt disilicide thin film by solution processing, Appl. Phys. Express,7 (2014) 055503.
  • Koji Nagahara, Bui Nguyen Quoc Trinh, Eisuke Tokumitsu, Satoshi Inoue, Tatsuya Shimoda, Fabrication of 120-nm-channel-length ferroelectric-gate thin-film transistor by nanoimprint lithography, Japan. J. Appl. Phys. 53 (2014) 02BC14.
  • Satoshi Inoue,Tomoki Ariga, Shin Matsumoto, Masatoshi Onoue, Takaaki Miyasako, Eisuke Tokumitsu, Norimichi Chinone, Yasuo Cho, Tatsuya Shimoda, Investigation of solution-processed bismuth-niobium-oxide films, J. Appl. Phys. 116 (2014) 154103.
  • Masatoshi Onoue, Takaaki Miyasako, Eisuke Tokumitsu, Tatsuya Shimoda, Observation of high dielectric constant of Bi-Nb-Ox thin-film capacitors fabricated by chemical solution deposition process, IEICE Electronics Express 11 (2014) 20140651.
  • Toshihiko Kaneda, Daisuke Hirose, Takaaki Miyasako, Phan Trong Tue, Yoshitaka Murakami, Shinji Kohara, Jinwang Li, Tadaoki Mitani, Eisuke Tokumitsu, Tatsuya Shimoda, Rheology Printing for Metal-Oxide Patterns and Devices, J. Mater. Chem. C 2 (2014) 40.