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Yukiko Takamura Associate Professor
School of Materials Science、Applied Physics Area

■Degrees

B.E. from The University of Tokyo (1993), M.E. from The University of Tokyo (1995), Ph.D. from The University of Tokyo (1998)

■Professional Career

JSPS Research Fellow(DC1)(1995-1998)
JSPS Research Fellow(PD)(1998-2001)
Guest Scientist at Materials Research Division, Max Planck Institute for Plasma Physics(1999-2000)
JSPS Research Associate(2001-2002)
Research Associate at Institute for Materials Research, Tohoku University(2002-2006)
Lecturer at School of Materials Science, JAIST(2006-2011)
Adjunct Member at Research Center for Integrated Science, JAIST(2007-2011)
Adjunct Associate Professor at World Premier International Research Center - Advanced Institute for Materials Research, Tohoku University(2009-2017)
Guest Researcher at Institute of Engineering Innovation, School of Engineering, The University of Tokyo(2009)
Associate Professor at School of Materials Science, JAIST(2011-)
Adjunct Member at Research Center for Simulation Science, JAIST(2015-2016)
Part-time Lecturer at Graduate School of Natural Science & Technology, Kanazawa University(2016-)

■Specialties

Thin film growth, Surface and Interface Engineering

■Research Keywords

thin films, UHV, epitaxy, boride, nitride, SPM, silicene

■Publications

◇Published Papers

  • Atomistic Study of GaSe/Ge(111) Interface Formed through van der Waals Epitaxy,T. Yonezawa, T. Murakami, K. Higashimine, A. Fleurence, Y. Oshima, and Y. Yamada-Takamura,Surface and Interface Analysis, accepted for publication.
  • Selenidation of epitaxial silicene on ZrB2,F. B. Wiggers, Y. Yamada-Takamura, A. Y. Kovalgin, and M. P. de Jong,Applied Surface Science 428, 793-797 (2018).
  • Guided molecular assembly on a locally reactive two-dimensional material,B. Warner, T. G. Gill, V. Caciuc, N. Atodiresei, A. Fleurence, Y. Yoshida, Y. Hasegawa, S. Blügel, Y. Yamada-Takamura, and C. F. Hirjibehedin,Advanced Materials 29, 1703929 (2017). Open Access

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◇Lectures and Presentations

  • Silicene and beyond: Group IV 2D materials in their epitaxial form,Y. Yamada-Takamura,International Union of Materials Research Societies – International Conference on Electronic Materials 2018 (IUMRS-ICEM 2018),Daejeon Convention Center, Daejeon, Korea,2018.08.19-24
  • Silicene and Beyond: Group IV 2D Materials in their Epitaxial Form,Y. Yamada-Takamura,The 2nd Nippon-Taiwan Workshop on Innovation of Emergent Materials,JAIST,2018.03.01
  • Atomistic study of GaSe/Ge(111) interface formed through van der Waals epitaxy (poster presentation),T. Yonezawa, T. Murakami, K. Higashimine, A. Fleurence, Y. Oshima, and Y. Yamada-Takamura,Atomic Level Characterization (ALC) '17,Kauai, U.S.A.,2017.12.05

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■Extramural Activities

◇Academic Society Affiliations

  • The Japan Society of Applied Physics,Planning Secretary of Thin Film and Surface Physics Division,2017-2018
  • The Japan Society of Applied Physics,Associate Editor of "OYO BUTURI",2011-2012
  • American Physical Society,2003-

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◇Other Activities

  • Science and Technology of Advanced Materials (STAM),Associate Editor, 2015-

■Academic Awards Received

  • The 46th Harada Young Research Award,The Honda Memorial Foundation,200607
  • Poster Award, IFCAM Workshop on Surface and Interface Science,200701
  • Best Poster Award, 3rd Materials Science School for Young Scientists,200608