Eisuke Tokumitsu Professor
Green Devices Research Center

■Degrees

Bachelor of Engineering from Tokyo Institute of Technology(1982), Master of Engineering from Tokyo Institute of Technology(1984), Ph.D from Tokyo Institute of Technology(1987)

■Professional Career

Assistant Professor at Tokyo Institute of Technology(1987), Researcher at AT&T Bell Laboratories(1988), Assistant Professor at Tokyo Institute of Technology(1990), Associate Professor at Precision and Intelligence Laboratory, Tokyo Institute of Technology(1992), Associate Professor at Research Institute of Electrical Communication, Tohoku University(2002), Associate Professor at Precision and Intelligence Laboratory, Tokyo Institute of Technology(2004)

■Publications

◇Published Papers

Ferroelectric-Gate Thin-Film Transistor Fabricated by Total Solution Deposition Process，Takaaki Miyasako, Bui Nguyen Quoc Trinh, Masatoshi Onoue, Toshihiko Kaneda, Phan Trong Tue, Eisuke Tokumitsu, and Tatsuya Shimoda，Japanese Journal of Applied Physics，50，2011，04DD09,1-6，2011/04/20
Source solution dependence on electrical properties of In-Zn-O channel thin film transistors，Eisuke Tokumitsu,Yasuhiro Takahashi, Toshihiko Kaneda, Tatsuya Shimoda，E-MRS 2011 Fall Meeting, XII6, Warsaw University of Technology, Warsaw, Poland, Sep.19-23, 2011
Electric Properties and Interface Charge Trap Density of Ferroelectric Gate Thin Film Transistor Using (Bi,La)4Ti3O12/Pb(Zr,Ti)O3 Stacked Gate Insulator，Pham Van Thanh, Bui Nguyen Quoc Trinh, Takaaki Miyasako, Phan Trong Tue, Eisuke Tokumitsu, and Tatsuya Shimoda，Jpn. J. Appl. Phys., 2012，vol.51-1-5，2012

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◇Lectures and Presentations

P-type Amorphous Oxide Semiconductors Ln-Ru-O from Solution Processing，Jinwang Li, Eisuke Tokumitsu, Mikio Koyano, and Tatsuya Shimoda，2011 Fall meeting, Materials Research Society，Boston, USA，Nov.28-Dec.2, 2011
Solution-processed oxide thin-film transistors using La-Ta-O/Bi-Nb-O stacked gate insulator，Takaaki Miyasako, Masatoshi Onoue, Hirokazu Tsukada, Eisuke Tokumitsu, and Tatsuya Shimoda，2011 Fall meeting, Materials Research Society，Boston, USA， Nov.28-Dec.2, 2011
Nano-sized PT Lines and Spaces Patterned by Nanoimprint Lithography and physical Dry-etching Method，Bui Nguyen Quoc Trinh, Toshihiko Kaneda, Takaaki Miyasako, Pham Van Thanh, Phan Trong Tue, Eisuke Tokumitsu, and Tatsuya Shimoda，The 10th international conference on Nanoimprint and Nanoprint Technology (NNT 2011)，The Shilla Jeju, Korea，Oct. 18-21, 2011