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Eisuke Tokumitsu Professor
School of Materials Science、Applied Physics Area

■Degrees

Bachelor of Engineering from Tokyo Institute of Technology(1982), Master of Engineering from Tokyo Institute of Technology(1984), Ph.D from Tokyo Institute of Technology(1987)

■Professional Career

Assistant Professor at Tokyo Institute of Technology(1987), Researcher at AT&T Bell Laboratories(1988), Assistant Professor at Tokyo Institute of Technology(1990), Associate Professor at Precision and Intelligence Laboratory, Tokyo Institute of Technology(1992), Associate Professor at Research Institute of Electrical Communication, Tohoku University(2002), Associate Professor at Precision and Intelligence Laboratory, Tokyo Institute of Technology(2004)

■Publications

◇Books

  • Applications of Oxide Channel Ferroelectric-Gate Thin Film Transistors,Eisuke Tokumitsu and Tatsuya Shimoda, ,“Ferroelectric-Gate Field Effect Transistor Memories”, Springer, 2016.
  • Oxide-Channel Ferroelectric-Gate Thin Film Transistors with Nonvolatile Memory Function,Eisuke Tokumitsu,“Ferroelectric-Gate Field Effect Transistor Memories”,Springer, 2016.

◇Published Papers

  • Fabrication of 120-nm-channel-length ferroelectric-gate thin-film transistor by nanoimprint lithography,Koji Nagahara, Bui Nguyen Quoc Trinh, Eisuke Tokumitsu, Satoshi Inoue, and Tatsuya Shimoda,Japanese Journal of Applied Physics,53,2014,02BC14,2014/1/29
  • Impact of UV/O3 treatment on solution-processed amorphous InGaZnO4 thin-film transistors,Kenichi Umeda, Takaaki Miyasako, Ayumu Sugiyama, Atsushi Tanaka, Masayuki Suzuki, Eisuke Tokumitsu and Tatsuya Shimoda,J. Appl. Phys.,113,184509,2013/05/13
  • Interface Charge Trap Density of Solution Processed Ferroelectric Gate Thin Film Transistor Using ITO/PZT/Pt Structure,Pham Van Thanh , Bui Nguyen Quoc Trinh , Takaaki Miyasako , Phan Trong Tue , Eisuke Tokumitsu and Tatsuya Shimoda,Ferroelectrics Letters Section, 40:1-3,17-29,2013/08/13

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◇Lectures and Presentations

  • Oxide-Channel Ferroelectric-Gate Thin Film Transistors Prepared by Solution Process,Eisuke Tokumitsu and Tatsuya Shimoda,22nd International Display Workshop (IDW 2015), Dec.9-11, Otsu, Japan, Paper AMD6-1.
  • Amorphous LaRuO Nano-patterningusing Rheology Printing Method,Koji Nagahara, Li Jinwang, Daisuke Hirose, Eisuke Tokumitsu ,and Tatsuya Shimoda,13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014) ,October 22-24, 2014, ANA Crowne Plaza Kyoto, Kyoto, Japan.,Kyoto, Japan,October 22-24, 2014
  • A Direct Imprinting for Fine Metal Oxide Patterns and Devices,Tatsuya Shimoda, Toshihiko Kaneda, Daisuke Hirose, Takaaki Miyasako, Phan Trong Tue, Yoshitaka Murakami, Shinji Kohara, Jinwang Li, Tadaoki Mitani, Eisuke Tokumitsu, & Shogo Nobukawa,13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014) (Invited) ,October 22-24, 2014,Kyoto, Japan,October 22-24, 2014

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