Hideki Matsumura Research Professor
Others
■Degrees
Dr.Eng. from Tokyo Institute of Technology (1975)
■Professional Career
Research Fellow at the University of Surrey, England (1975), Research Associate at Tokyo Institute of Technology (1977), Associate Professor at Hiroshima University (1983)
■Specialties
Electronic Materials and DevicesThin Film Technology
■Research Keywords
Cat-CVD technology, Display Technology (MAT-FPD)
■Research Interests
Catalytic CVD (Cat-CVD) The work of our research group is in electronic materials and electronic device engineering. We are developing a new deposition method, named ``catalytic chemical vapor deposition (Cat-CVD)'' method, by which high-quality amorphous-silicon, poly-silicon, insulating silicon-nitride and other electronic materials can be deposited at low temperatures. These materials are usable for solar cells, thin film transistors on a liquid crystal display panels and large scale integrated circuits (LSIs). By this method, we obtain higher quality amorphous silicon than by the conventional method such as the glow discharge decomposition method using silane gas. We also obtain poly-silicon whose carrier mobility reaches several-tens cm2/Vs.
 Novel nanometer-size transistors and high-efficiency solar cells We are also developing novel nanometer-size transistors, which are made from only metals and insulators. Recently, this new transistor with only 16 nm-long channel can be successfully operated. Furthermore, we are also developing high-efficiency solar cells in which a new energy-conversion mechanism is installed.
■Publications
◇Published Papers
- Liquid-phase explosive crystallization of electron-beam-evaporated a-Si films induced by flash lamp annealing,Keisuke Ohdaira and Hideki Matsumura,J. Cryst. Growth,362,149,2013
- Flash-Lamp-Induced Explosive Crystallization of Amorphous Germanium Films Leaving Behind Periodic Microstructures,K. Ohdaira and H. Matsumura,Thin Solid Films,524,161-165,2012
- Large-Grain Polycrystalline Silicon Films Formed through Flash-Lamp-Induced Explosive Crystallization,Keisuke Ohdaira, Keisuke Sawada, Noritaka Usami, Sergey Varlamov, and Hideki Matsumura,Jpn. J. Appl. Phys.,51,10NB15,2012
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◇Lectures and Presentations
- Observation of Different Explosive Crystallization Modes in Sputtered, Evaporated, and Their Stacked a-Si Films,K. Ohdaira and H. Matsumura,2012 MRS Spring Meeting,San Francisco, USA,2012年4月9-13日
- Formation of polycrystalline silicon films with μm-order-long grains through liquid-phase explosive crystallization by flash lamp annealing,K. Ohdaira, S. Varlamov, N. Usami, and H. Matsumura,38th IEEE Photovoltaic Specialists Conference,Austin, USA,June 3-8, 2012
- Liquid-phase Explosive Crystallization of Electron-beam-evaporated a-Si Films Induced by Flash Lamp Annealing,Keisuke Ohdaira and Hideki Matsumura,International Conference on Materials for Advanced Technologies 2011 (The 5th Asian Conference on Crystal Growth and Crystal Technology),Suntec Singapore International Convention & Exhibition Centre,26 June - 1 July 2011
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■Extramural Activities
◇Other Activities
- International Display Workshop,Member of Program Committee (1998-2000)
- NEDO New Sunshine Project,Member of Technical Committee (1998-2000)
- Japan Society of Applied Physics,Member of Editorial Board (1998-2000)
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■Academic Awards Received
- Patent of the year 2007
- Patent of the year 2007
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