大平　圭介 （オオダイラ　ケイスケ）　准教授
グリーンデバイス研究センター

124件中21-40件目

• 21.　Microstructure of Polycrystalline Silicon Films Formed through Explosive Crystallization Induced by Flash Lamp Annealing，Keisuke Ohdaira, Shohei Ishii, Naohito Tomura, and Hideki Matsumura，Jpn. J. Appl. Phys.，50，04DP01，2011
• 22.　Lateral crystallization velocity in explosive crystallization of amorphous silicon films induced by flash lamp annealing，Keisuke Ohdaira, Naohito Tomura, Shohei Ishii, and Hideki Matsumura，Electrochemical and Solid-State Letters，14，pp. H372-H374，2011
• 23.　Lateral Crystallization of Amorphous Silicon films Induced by Flash Lamp Annealing，Keisuke Ohdaira, Shohei Ishii, Naohito Tomura, Hideki Matsumura，Proceedings of the 7th Thin-Films Materials and Devices Meeting，110107015，2011
• 24.　Flash-Lamp-Induced Explosive Crystallization of Amorphous Films Leaving Behind Periodic Microstructures，Keisuke Ohdaira and Hideki Matsumura，Extended Abstract of the 2011 International Conference on Solid State Devices and Materials (SSDM 2011), p.1387，2011/9/28
• 25.　Large-Grain Polycrystalline Silicon FilmsFormed Through Flash-Lamp-Induced Explosive Crystallization，Keisuke Ohdaira, Keisuke Sawada, Noritaka Usami, Sergey Varlamov, and Hideki Matsumura，Technical Digest of the 21st International Photovoltaic Science and Engineering Conference (PVSEC-21)，4D-2P-07，2011
• 26.　Catalytic decomposition of NH3 on heated Ru and W surfaces，Hironobu Umemoto, Yuta Kashiwagi, Keisuke Ohdaira, Hiroyuki Kobayashi, and Kanji Yasui，Thin Solid Films，519，pp. 4429-4431，2011
• 27.　Carrier Recombination Mechanisms in Solar Cells Fabricated Using Flash-Lamp-Crystallized Polycrystalline Silicon Films，Keisuke Ohdaira, Shohei Ishii, Naohito Tomura, and Hideki Matsumura，Proceedings of the 37th IEEE Photovoltaic Specialists Conference (in press)
• 28.　Extremely Low Recombination Velocity on Crystalline Silicon Surfaces Realized by Low-Temperature Impurity Doping in Cat-CVD Technology，T. Hayakawa, M. Miyamoto, K. Koyama, K. Ohdaira, and H. Matsumura，Thin Solid Films，519，4466，2011
• 29.　Flash-Lamp-Crystallized Polycrystalline Silicon Films with High Hydrogen Concentration Formed from Cat-CVD a-Si Films，K. Ohdaira, N. Tomura, S. Ishii, and H. Matsumura，Thin Solid Films，519，4459-4461，2011
• 30.　Excellent passivation effect of Cat-CVD SiNx/i-a-Si stack films on Si substrates，K. Koyama, K. Ohdaira, and H. Matsumura，Thin Solid Films，519，4473-4475，2011
• 31.　Low Resistivity Metal Lines Formed by Functional Liquids and Successive Treatment of Catalytically Generated Hydrogen Atoms in Cat-CVD System，N. T. T. Kieu, K. Ohdaira, T. Shimoda, and H. Matsumura，Thin Solid Films，519，4565，2011
• 32.　Advantage of Plasma-Less Deposition in Cat-CVD to the Performance of Electronic Devices，H. Matsumura, T. Hasegawa, S. Nishizaki, and K. Ohdaira，Thin Solid Films，519，4568-4570，2011
• 33.　フラッシュランプアニールによるa-Si 膜の横方向結晶化，大平圭介, 石井翔平, 渡村尚仁, 松村英樹，薄膜材料デバイス研究会第7回研究集会講演予稿集，pp. 119-122，2010年11月5日
• 34.　Polycrystalline Silicon Films with Nanometer-Sized Dense Fine Grains Formed by Flash-Lamp-Induced Crystallization，Keisuke Ohdaira, Shohei Ishii, Naohito Tomura, and Hideki Matsumura，Abstracts of Asian Conference on Nanoscience and Nanotechnology (AsiaNANO 2010)，Oral_F04
• 35.　Electrical Properties of Polycrystalline Silicon Films Formed from Amorphous Silicon Films by Flash Lamp Annealing，T. Nishikawa, K. Ohdaira, and H. Matsumura，Current Applied Physics，11，604-607，2011
• 36.　Impact of Glass Substrates on the Properties of Solar Cells Fabricated Using Flash-Lamp-Crystallized Polycrystalline Silicon Films，K. Ohdaira, S. Ishii, N. Tomura, and H. Matsumura，Proceedings of the 26th European Photovoltaic Solar Energy Conference and Exhibition, p.2799, 2011
• 37.　Extremely Low Surface Recombination Velocities Realized by Cat-CVD SiNx/a-Si Staked Films on (100) and (111) Crystalline Si Substrates，K. Koyama, K. Kato, K. Ohdaira, and H. Matsumura，Proceedings of the 26th European Photovoltaic Solar Energy Conference and Exhibition, p.1678, 2011
• 38.　Low Temperature Phosphorus Doping in Silicon Using Catalytically Generated Radicals，Taro Hayakawa, Yuuki Nakashima, Motoharu Miyamoto, Koichi Koyama, Keisuke Ohdaira, and Hideki Matsumura，Jpn. J. Appl. Phys，50，121301，2011
• 39.　Why Can Cat-CVD SiNx/a-Si Stacked Layers Realize Extremely Low Surface Recombination Velocity on Crystalline Silicon?，Koichi Koyama, Kazuhiro Kato, Keisuke Ohdaira, and Hideki Matsumura，Technical Digest of the 21st International Photovoltaic Science and Engineering Conference (PVSEC-21)，3A-1O-04，2011
• 40.　Mechanism and Control of Crack Generation in Glass Substrates during Crystallization of a-Si Films by Flash Lamp Annealing，Keisuke Ohdaira, Naohito Tomura, Shohei Ishii, Keisuke Sawada, and Hideki Matsumura，J. Non-cryst. Solids，358，2154，2012

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