北陸先端科学技術大学院大学 [JAIST] - 研究者総覧
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大平 圭介 (オオダイラ ケイスケ) 准教授
マテリアルサイエンス系、環境・エネルギー領域

205件中1-20件目

  • 1. Passivation effect of ultra-thin SiNx films formed by Cat-CVD for crystalline silicon surface,H. Song and K. Ohdaira,Jpn. J. Appl. Phys.,57,08RB03-1-4,2018
  • 2. Texture size control by mixing glass micro-particles with alkaline solution for crystalline silicon solar cells,Cong Thanh Nguyen, K. Koyama, Huynh Thi Cam Tu, K. Ohdaira, and H. Matsumura,J. Mater. Res.,33,11,pp. 1515-1522,2018
  • 3. High-quality surface passivation of c-Si with chemical resistance and optical transparency by using Cat-CVD SiNx double layers and an ultra-thin SiOx film,Huynh Thi Cam Tu, K. Koyama, Cong Thanh Nguyen, K. Ohdaira, and H. Matsumura,Jpn. J. Appl. Phys.,57,08RB17,2018
  • 4. Multistage performance deterioration in n-type crystalline silicon photovoltaic modules undergoing potential-induced degradation,Y. Komatsu, S. Yamaguchi, A. Masuda, and K. Ohdaira,Microelectronics Reliability,84,127-133,2018
  • 5. Effect of evacuating a chamber on the degradation rate of solar cells in a cell-level potential-induced degradation test,S. Yamaguch and K. Ohdaira,Jpn. J. Appl. Phys. (in press)
  • 6. Effect of starting point formation on the crystallization of amorphous silicon films by flash lamp annealing,D. Sato and K. Ohdaira,Jpn. J. Appl. Phys,57,04FS05,2018
  • 7. Photoresist removal using H radicals generated by iridium hot wire catalyst,M. Yamamoto, S. Nagaoka, H. Umemoto, K. Ohdaira, T. Nishiyama, and H. Horibe,Int. J. Polym. Sci.,2017,2983042-1-5,2017
  • 8. Passivation of textured crystalline silicon surfaces by Cat-CVD silicon nitride films and catalytic phosphorus doping,K. Ohdaira, Trinh Thi Cham, and H. Matsumura,Jpn. J. Appl. Phys.,56,102301-1-4,2017
  • 9. Direct observation of changes in the effective minority-carrier lifetime of SiNx-passivated n-type crystalline-silicon substrates caused by potential-induced degradation and recovery tests,N. Nishikawa, S. Yamaguchi, and K. Ohdaira,Microelectronics Reliability,79,91-95,2017
  • 10. Super water-repellent treatment of various cloths by deposition of Cat-CVD PTFE films,H. Matsumura, M. Mishiro, M. Takachi, and K. Ohdaira,J. Vac. Sci. Technol. A,35,061514-1-6,2017
  • 11. ITO sputtering damage to silicon heterojunction solar cells with Cat-CVD a-Si films and its recovery,K. Konishi and K. Ohdaira,Proc. 33rd European Photovoltaic Solar Energy Conference and Exhibition, 2017 (in press)
  • 12. Low-cost fabrication of patterned electrodes in hetero-junction back-contact silicon solar cells by plasma ion-implantation,K. Koyama, K. Ohdaira, and H. Matsumura,Proc. 33rd European Photovoltaic Solar Energy Conference and Exhibition,729-731,2017
  • 13. Effect of starting point formation on the crystallization of amorphous silicon films by flash lamp annealing,D. Sato and K. Ohdaira,Extended Abstract of the 2017 International Conference on Solid State Devices and Materials (SSDM2017), C-1-03, 2017
  • 14. Comprehensive study of potential-induced degradation in silicon heterojunction photovoltaic cell modules,S. Yamaguchi, C. Yamamoto, K. Ohdaira, and A. Masuda,Prog. Photovoltaics Res. Appl.,2018,26,697-708,2018
  • 15. Novel chemical cleaning of textured crystalline silicon for realizing surface recombination velocity <0.2 cm/s using passivation Cat-CVD SiNx/a-Si stacked layers,C. T. Nguyen, K. Koyama, S. Terashima, C. Okamoto, S. Sugiyama, K. Ohdaira, and H. Matsumura,Jpn. J. Appl. Phys.,56,056502-1-7,2017
  • 16. 触媒化学気相堆積(Cat-CVD)法による太陽電池用高品質パッシベーション膜の形成,大平 圭介、Trinh Cham Thi、及川貴史、瀬戸純一、小山晃一、松村英樹,表面科学,38,pp. 234-239,2017
  • 17. Improved quality of flash-lamp-crystallized polycrystalline silicon films by using low defect density Cat-CVD a-Si films,T. Nozawa and K. Ohdaira,Int. J. Mater. Res.,108,827-831,2017
  • 18. Reduction in the short-circuit current density of silicon heterojunction photovoltaic modules subjected to potential-induced degradation tests,S. Yamaguchi, C. Yamamoto, K. Ohdaira, and A. Masuda,Sol. Energy Mater. Sol. Cells,161,439-443,2017
  • 19. Effect of anti-reflection coating on the crystallization of amorphous silicon films by flash lamp annealing,Y. Sonoda and K. Ohdaira,Jpn. J. Appl. Phys.,56,04CS10-1-4,2017
  • 20. Catalytic phosphorus and boron doping to amorphous silicon films,K. Ohdaira, J. Seto, and H. Matsumura,Jpn. J. Appl. Phys.,56,08MB06-1-5,2017

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