北陸先端科学技術大学院大学 [JAIST] - 研究者総覧
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増田 貴史 (マスダ タカシ) 講師
マテリアルサイエンス系、環境・エネルギー領域

30件中1-20件目

  • 1. Fabrication of n-type Si nanostructures by direct nanoimprinting with liquid-Si ink,
    H. Takagishi, T. Masuda, K. Yamazaki and T. Shimoda,
    AIP Advances,8,015214
  • 2. X-ray absorption near edge structure analysis of the chargeedischarge mechanisms of dithiobiuret polymer used as a high-capacity cathode material for lithium-ion batteries,H. Uemachi, Y. Tamenori, T. Itono, T. Masuda, T. Shimoda, A. Fujiwara,Electrochim. Acta,281,99,2018
  • 3. Evaporation of an inkjet droplet on a flat substrate,
    T. Masuda and T. Shimoda,
    Japnese Journal of Applied Physics,56,016701,2017
  • 4. Incorporation of silicon into monodispersed starburst carbon spheres with LVD method,
    K. Yano, N. Tatsuda, T. Masuda, T. Shimoda,
    Microporous and Mesoporous Materials,247,46-51,2017
  • 5. Formation of amorphous silicon passivation films with high stability against post-annealing, air exposure and light soaking using liquid silicon,
    C. Guo, K. Ohdaira, H. Takagishi, T. Masuda, Z. Shen, T. Shimoda,
    Japanese Journal of Applied Physics,55,04ES12,2016
  • 6. Direct imprinting of liquid silicon,
    T. Masuda, H. Takagishi, K. Yamazaki, T. Shimoda,
    ACS Applied Materials & Interfaces,8,9969,2016
  • 7. Properties of phosphorus-doped silicon-rich amorphous silicon carbide film prepared by a solution process,
    T. Masuda, A. Iwasaka, H. Takagishi, T. Shimoda,
    Journal of the American Ceramic Society,99,1651,2016
  • 8. Well-defined silicon patterns by imprinting of liquid silicon,
    R. Kawajiri, H. Takagishi, T. Masuda, T. Kaneda, K. Yamazaki, Y. Matsuki, T. Mitani, T, Shimoda,
    Journal of Materials Chemistry C,4,3385,2016
  • 9. Photoelectron yield spectroscopy and inverse photoemission spectroscopy evaluations of p-type amorphous silicon carbide films prepared using liquid materials,
    T. Murakami, T. Masuda, S. Inoue, H. Yano, N. Iwamuro, T. Shimoda,
    AIP Advances,6,055021,2016
  • 10. Novel Method to Incorporate Si into Monodispersed Mesoporous Carbon Spheres,
    K. Yano, N. Tatsuda, T. Masuda, T. Shimoda,
    Journal of Colloid and Interface Science,479,20,2016
  • 11. Preparation and characterization of polymer-derived amorphous silicon carbide with silicon-rich stoichiometry,
    T. Masuda, A. Iwasaka, H. Takagishi, T. Shimoda,
    Thin Solid Films,612,284,2016
  • 12. SiCインクの合成と塗布法による半導体用アモルファスSiC薄膜,
    下田達也, 増田貴史
    セラミックス,51,8,500,2016
  • 13. Silicon deposition in nanopores using a liquid precursor,
    T. Masuda, N. Tatsuda, K. Yano, T. Shimoda,
    Scientific Reports,6,37689,2016
  • 14. Fabrication of high-quality amorphous silicon film from cyclopentasilane by vapor deposition between two parallel substrates,
    Z. Shen, T. Masuda, H. Takagishi, K. Ohdaira, and T. Shimoda,
    Chemical Communications,51,4417,2015
  • 15. Photo-stability of a-Si solar cells fabricated by “Liquid-Si printing method” and treated with catalytic generated atomic hydrogen,
    H. Murayama, T. Ohyama, I. Yoshida, A. Terakawa, T. Masuda, K. Ohdaira, T. Shimoda,
    Thin Solid Films,575,100,2015
  • 16. Polymeric precursor for solution-processed amorphous silicon carbide,
    T. Masuda, A. Iwasaka, H. Takagishi, T. Shimoda,
    Journal of Materials Chemistry C,3,12212,2015
  • 17. Phosphorus- and boron-doped hydrogenated amorphous silicon filmsprepared using vaporized liquid cyclopentasilane,
    T. Masuda, H. Takagishi, Z. Shen, K. Ohdaira, and T. Shimoda,
    Thin Solid Films,589,221,2015
  • 18. Amorphous silicon carbide films prepared using vaporized silicon ink,
    T. Masuda, Z. Shen, H. Takagishi, K. Ohdaira, and T. Shimoda,
    Japanese Journal of Applied Physics,53,031304,2014
  • 19. Effects of catalytic-generated atomic Hydrogen treatment on a-Si fabricated by Liquid-Si Printing,
    H. Murayama, T. Ohyama, A. Terakawa, H. Takagishi, T. Masuda, K. Ohdaira, and T. Shimoda,
    Japanese Journal of Applied Physics,53,05FM06,2014
  • 20. Liquid silicon and its application for electronics,
    T. Shimoda and T. Masuda
    Japanese Journal of Applied Physics,53,02BA01,2014

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