Susumu Horita Associate Professor
School of Materials Science（Department of Materials Science・Materials Characterization and Device）

Results 1-20 of about 56

• 1.　Passivation Effect of F+Y Monolayer on Yttria-stabilized Zirconia (YSZ) Layers of LTPS，S. Horita，Proc. of the 16th International Display Workshops (IDW'10), FMCp-24, pp.889-892,，Fukuoka International Congress Center, Fukuoka, Japan，2010/12/2
• 2.　Low-temperature Growth of Crystallized Si Film on Yttria-Stabilized Zirconia Stimulation Layer，S. Hana, T. Akahori and S. Horita，Proc. of the 15th International Display Workshops (IDW'08), FMC1-1, pp.271-274, World Convention Center Summit，Miyazaki, Japan，2009/12/9-12/11
• 3.　New Functional Device Characteristics with 2-Dimensional Array of Si Nanodisk Fabricated by Combination of Bio-Template and Ultimate Top-down Etching，M. Igarashi, C.-H. Huang, M. Tomura, M. Takeguchi, S. Horita, Y. Uraoka, T. Fuyuki, I. Yamashita, T. Morie, and S. Samukawa，Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials (SSDM 2009), J-9-3, pp.1364-1365.，Miyagi, Japan， 2009/10/7-10/9
• 4.　A New Structure of nanodisk (Stacked Nanodisk) fabricated by bio-nano-process and defect-free neutral beam etching，C.-. Huang, M. Igarashi, M. Tomura, M. Takeguchi, S. Horita, Y. Uraoka, T. Fuyuki, I. Yamashita, and S. Samukawa，Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials (SSDM 2009), J-9-4,pp.1366-1367.，Miyagi, Japan，2009/10/7-10/9
• 5.　Low-temperature Fabrication of a Crystallized Si Film Deposited on a Glass Substrate using an Yttria-stabilized Zirconia Seed Layer，S. Hana and S. Horita，Material Research Society(MRS) Spring Meeting,(2009), A5.5.，San Francisco, U.S.A.，2009/4/13-4/17
• 6.　Writing Disturbance-Free of a Ferroelectric Gate Field Effect Transistor Memory with an Intermediate Electrode，S. Horita and B. N. Q. Trinh，Extended Abstracts of the 2008 International Conference on Solid State Devices and Materials (SSDM 2008), P-4-8L, pp.470.，Tsukuba, Japan，2008/9/25
• 7.　Effect of Surface Treatment of YSZ Seed Layer on Low-temperature Growth of a Poly-Si Thin Film on a Glass Substrate，Sukreen Hana and Susumu Horita，Digest of Technical Papers, The 15th International Workshop on Active-Matrix Flat Panel Displays(AM-FPD 08), P-L4, pp.243-244.，The National Museum of Emerging Science and Innovation(MIRAIKAN), Tokyo, Japan.，2008/7/3
• 8.　Nondestructive Readout of Integrated Ferroelectric Gate FET Memory with Intermediate Electrode by New Data Writing and Reading Method，B. N. Q. Trinh and S. Horita，International Symposium on Integrated Ferroelectrics　ISIF 2008, 5-72-P.，Singapore，2008/6/10
• 9.　Using New Operation Method for Improvement in Nondestructive Readout of Ferroelectric Gate FET Memory with an Intermediate Electrode，B. N. Q. Trinh and S. Horita，International Symposium on Integrated Ferroelectrics　ISIF 2008, 5-124-C.，Singapore.，2008/6/10
• 10.　Effect of Y2O3 Content in a YSZ Seed Layer on Crystallization of a Low-Temperature-Deposited Si Film，S. Hana　and S. Horita，The 15th International Display Workshops (IDW'08),AMDp4-2, pp.639-642, Nigata, Japan，2008/12/4
• 11.　Improvement of Nondestructive Readout of Ferroelectric Gate FET Memory with an Intermediate Electrode by using New Data Writing and Reading Methods，B. N. Q. Trinh and S. Horita，2007 16th IEEE International Symposium on the Applications of Ferroelectrics(IEEE ISAF-2007), 30B-FR5-O2, Technical Proc.,，Nara, Japan.，2007/6/30
• 12.　Material Properties of Low-Temperature Si Oxide Film Formed by Using Silicone Oil and Ozone Gas，Susumu Horita, Kouich Toriyabe and Kensuke Nishioka，Proc. of the 14th International Display Workshops (IDW'07), pp.1865-1868,，Sapporo Convention Center, Sapporo, Japan，2007/12/7
• 13.　Antireflection Subwavelength Structure Formed by Wet Process Using Nano Particles of Nobel Metal Catalyst，Kensuke Nishioka, Susumu Horita, Keisuke Ohdaira, Hideki Matsumura, Yu Takahashi and Takashi Fuyuki，Technical Digest of the 17th Internationa Photovoltaic Science and Engineering Conference (PVSEC-17), 4P-P2-29, pp. 430-431.，Fukuoka, Japan，2007/12/4
• 14.　Fabrication of Periodic Arrays of Nano-sized Si and Ni dots on SiO2 Using Linearly Polarized Nd:YAG Pulsed Laser，Kensuke Nishioka and Susumu Horita，Abs. Material Research Society(MRS) Fall Meeting,(2007), kk8.9,，Boston, MA, U.S.A.，2007/11/28
• 15.　Nano-sized Taper Structure Formed by Wet Process Using Catalysis of Gold Nanoparticle，Kensuke Nishioka and Susumu Horita，Abs. Material Research Society(MRS) Fall Meeting,(2007), kk9.7,， Boston, MA, U.S.A.，2007/11/28
• 16.　Antireflection Subwavelength Structure Formed by Wet Process Using Nano Particles of Nobel Metal Catalyst，Kensuke Nishioka, Susumu Horita, Keisuke Ohdaira, Hideki Matsumura, Yu Takahashi and Takashi Fuyuki，Technical Digest of the 17th Internationa Photovoltaic Science and Engineering Conference (PVSEC-17), 4P-P2-29, pp. 430-431.，Fukuoka, Japan，2007/12/4
• 17.　Non-destructive Readout Characteristics of a Polycrystalline Ferroelectric Gate FET Memory with an Intermediate Electrode，B. N. Q. Trinh and S. Horita，The 5th Asian Meeting on Ferroelectrics, O-4-C-04，Tokyo University of Science, Noda, Chiba-ken, JapanUniversity of Science, Noda, Chiba-ken, Japan，2006年9月4日
• 18.　Low-temperature Formation of Si Oxide Film by using Silicone Oiland Ozone Gas ，T. Toriyabe, K. Nishioka and S. Horita，The 13th International Display Workshops(IDW'06)，Otsu Prince Hotel, Otsu, Japan，2006年12月7日
• 19.　Periodic Alignment of Silicon Dot Fabricated by LinearlyPolarized Nd:YAG Pulse Laser，Kensuke Nishioka and Susumu Horita，Material Research Society(MRS) Spring Meeting, A15.3，San Francisco, U. A. S，2006年4月19日
• 20.　abrication of Crystallized Si Film Deposited on aPolycrystalline YSZ Film/Glass Substrate at Low Temperature，Susumu Horita, Keisuke Kanazawa, Kensuke Nishioka and Mikio Koyano，Material Research Society(MRS) Spring Meeting, A21.7，San Francisco , U. S. A.，2006年4月20日

1  2  3

[ Next ≫ ]