Keisuke Ohdaira Associate Professor
Green Devices Research Center

Results 61-80 of about 85

• 61.　New Application of Cat-CVD Technology and Recent Status of Industrial Implementation，Hideki Matsumura and Keisuke Ohdaira，5th Int. Conf. on Hot-Wire Chemical Vapor Deposition (HWCVD, Cat-CVD)，Cambridge, USA，August 20-24, 2008
• 62.　THIN FILM P-I-N POLY-SI SOLAR CELLS DIRECTLY CONVERTED FROM P-I-N A-SI STRUCTURES BY A SINGLE SHOT OF FLASH LAMP，Keisuke Ohdaira, Tomoko Fujiwara, Yohei Endo, Kazuhiro Shiba, Hiroyuki Takemoto, Shogo Nishizaki, Young Rae Jang, Kensuke Nishioka, and Hideki Matsumura，33rd IEEE Photovoltaic Specialists Conf.，San Diego, USA，May 11-16, 2008
• 63.　Formation of micrometer-order-thick poly-Si films on textured glass substrates by flash lamp annealing of a-Si films prepared by catalytic chemical vapor deposition，K. Ohdaira, T. Fujiwara, Y. Endo, K. Nishioka, and H. Matsumura，The 4th Asian Conf. on Cryst. Growth and Cryst. Tech.，Sendai, Japan，21-24 May, 2008
• 64.　Future of Thin Film Transistors for Flat Panel Displays，H. Matsumura, K. Ohdaira，The Fifteenth International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD ’08)，The Natipnal Museum of Emerging Science and Innovation, Tokyo，July 2-4, 2008
• 65.　Formation of Polycrystalline Si Films over 3 μm in Thickness on Quartz Substrates by Flash Lamp Annealing，K. Ohdaira, Y. Endo, T. Fujiwara, S. Nishizaki, K. Nishioka, H. Matsumura, T. Karasawa, and T. Torikai，22nd European Photovoltaic Solar Energy Conference and Exhibition，Milan, Italy，3-7 September 2007
• 66.　Influence of the Surface Roughness of Substrate on the Defect Density of Hydrogenated Amorphous Silicon Film，K. Sugita, K. Ohdaira, and H. Matsumura，The 22nd International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 22)，Colorado, USA，19-24 August, 2007
• 67.　Extension of lifetime of catalyzing wires in Cat-CVD by their surface modification，K. Honda, K. Ohdaira, and H. Matsumura，The 22nd International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 22)，Colorado, USA，19-24 August, 2007
• 68.　Antireflection Subwavelength Structure Formed by Wet Process Using Nano Particles of Noble Metal Catalyst，K. Nishioka, S. Horita, K. Ohdaira, H. Matsumura, Y. Takahashi, and T. Fuyuki，17th International Photovoltaic Science and Engineering Conference，Fukuoka, Japan，3-7 December, 2007
• 69.　High-Quality Polycrystalline Silicon Films with Long Carrier Lifetime Prepared by Flash Lamp Annealing of Cat-CVD Amorphous Silicon and Sucsessive High-pressure Water Vapor Annealing，Y. Endo, T. Fujiwara, S. Nishizaki, K. Nishioka, and H. Matsumura，17th International Photovoltaic Science and Engineering Conference，Fukuoka, Japan，3-7 December, 2007
• 70.　Feasibility Study on High Efficiency Poly-Si Thin Film Solar Cells Formed by Flash Lamp Annealing of Cat-CVD Amorphous Silicon，T. Fujiwara, Y. Endo, S. Nishizaki, K. Ohdaira, K. Nishioka, and H. Matsumura，17th International Photovoltaic Science and Engineering Conference，Fukuoka, Japan，3-7 December, 2007
• 71.　Structural Investigation of Polycrystalline Silicon Films Formed on Glass Substrates by Flash Lamp Annealing of Precursor Amorphous Silicon，K. Ohdaira, T. Fujiwara, Y. Endo, S. Nishizaki, K. Nishioka, and H. Matsumura，17th International Photovoltaic Science and Engineering Conference，Fukuoka, Japan，3-7 December, 2007
• 72.　Pixel Controlling Substrates Using CrystallineSilicon LSI Chips Embedded in Flexible OrganicFilms，R. Ishizuka, K. Ohdaira, H. Matsumura, and M. Ishikawa，The 13th International Display Workshops (IDW '06)，Otsu, Japan，6-8 December, 2006
• 73.　Poly-Si Films with Long Carrier Lifetime Prepared by Rapid Thermal Annealing of Cat-CVD Amorphous Silicon Thin Films，K. Ohdaira, Y. Abe, M. Fukuda, S. Nishizaki, N. Usami, K. Nakajima, T. Karasawa, T. Torikai, and H. Matsumura，The 4th International Conference on Hot-Wire CVD (Cat-CVD) Process，Takayama, Gifu, Japan，4-8 October 2006
• 74.　Protection of Organic Light-Emitting Diodes over 50 000 Hours by Cat-CVD SiNx/SiOxNy Stacked Thin Films，Y. Ogawa, K. Ohdaira, T. Oyaidu, and H. Matsumura，The 4th International Conference on Hot-Wire CVD (Cat-CVD) Process，Takayama, Gifu, Japan，4-8 October 2006
• 75.　A Novel Method for Suppressing Silicidation of Tungsten Catalyzer During Silane Decomposition in Cat-CVD，K. Honda, K. Ohdaira, and H. Matsumura，The 4th International Conference on Hot-Wire CVD (Cat-CVD) Process，Takayama, Gifu, Japan，4-8 October 2006
• 76.　Fabrication of PTFE Thin Film by Dual Catalytic Chemical Vapor Deposition Method，H. Yasuoka, M. Yoshida, K. Sugita, K. Ohdaira, H. Murata, and H. Matsumura，he 4th International Conference on Hot-Wire CVD (Cat-CVD) Process，Takayama, Gifu, Japan，4-8 October 2006,
• 77.　Relationship between Defect Density of Cat-CVD a-Si and Textured Structure of Substrates，K. Sugita, K. Koyama, K. Ohdaira, and H. Matsumura，The 4th International Conference on Hot-Wire CVD (Cat-CVD) Process，Takayama, Gifu, Japan，4-8 October 2006
• 78.　Formation of Gas Barrier Films by Cat-CVD Method Using Organic Silicon Compounds，T. Oyaidu, Y. Ogawa, K. Tsurumaki, K. Ohdaira, and H. Matsumura，The 4th International Conference on Hot-Wire CVD (Cat-CVD) Process，Takayama, Gifu, Japan，4-8 October 2006
• 79.　A New Type Poly-Si Prepared by Fast Lamp Annealing of Cat-CVD a-Si and its Defect passivation by High Pressure Water Vapor Annealing，H. Matsumura, K. Ohdaira, M. Fukuda, Y. Abe, N. Usami, K. Nakajima, T. Karasawa, and T. Torikai，21st European Photovoltaic Solar Energy Conference and Exhibition，Dresden, Germany，4-8 September 2006
• 80.　A Novel Technique to Fabricate Back Contact HIT Solar Cells by Simple Hard Mask Process Without Photolithography，K. Ohdaira, K. Koyama, K. Sugita, and H. Matsumura，21st European Photovoltaic Solar Energy Conference and Exhibition，Dresden, Germany，4-8 September 2006

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