Keisuke Ohdaira Associate Professor
Green Devices Research Center

Results 1-20 of about 85

• 1.　Study of the Relationship Between a Gas-Barrier Property and the Membrane Stress of Films Made by a Cat-CVD Method，T. Tsutsumi, H. Yanagihara, H. Amanai, S.Yoshida, Y. Watanabe, K. Ohdaira, and H. Matsumura，55th 2012 SVC Annual Technical Conference, Santa Clara, USA, 2012年4月28-5月3日
• 2.　Formation of polycrystalline silicon films with μm-order-long grains through liquid-phase explosive crystallization by flash lamp annealing，K. Ohdaira, S. Varlamov, N. Usami, and H. Matsumura，38th IEEE Photovoltaic Specialists Conference，Austin, USA，June 3-8, 2012
• 3.　Photovoltaic Technology in JAIST, Japan, and East Asia，K. Ohdaira，The 2nd China-Japan-Korea Young Researchers Workshop，Shanghai, China，2012年4月28日
• 4.　Observation of Different Explosive Crystallization Modes in Sputtered, Evaporated, and Their Stacked a-Si Films，K. Ohdaira and H. Matsumura，2012 MRS Spring Meeting，San Francisco, USA，2012年4月9-13日
• 5.　Defect Termination of Flash-Lamp-Crystallized Large-Grain Polycrystalline Silicon Films by High-Pressure Water Vapor Annealing，Keisuke Ohdaira，2012 International Conference on Solid State Devices and Materials (SSDM2012)，京都国際会館，2012年9月25-27日
• 6.　Study on Light-Soaking Degradation and Damp Heat Tests for Cat-CVD SiNx/a-Si Stacked Passivation Films Realizing Extremely Low Surface Recombination Velocity，K. Koyama, T. Goto, K. Ohdaira, and H. Matsumura，27th European Photovoltaic Solar Energy Conference and Exhibition，フランクフルト、ドイツ，2012年9月24-28日
• 7.　The control of the film stress of Cat-CVD a-Si films and its impact on explosive crystallization induced by flash lamp annealing，K. Ohdaira，7th International Conference on Hot-Wire Chemical Vapor Deposition，大阪，2012年10月8-12日
• 8.　Surface passivation of c-Si wafers using Cat-CVD SiNx/Si-rich SiNx stacked films，Trinh Cham Thi, K. Koyama, K. Ohdaira, and H. Matsumura，7th International Conference on Hot-Wire Chemical Vapor Deposition，大阪，2012年10月8-12日
• 9.　Photo-stability of a-Si solar cells fabricated by “Liquid-Si printing method” and treated with catalytic generated atomic hydrogen，H. Murayama, T. Ohyama, I. Yoshida, A. Terakawa, T. Masuda, K. Ohdaira, and T. Shimoda，7th International Conference on Hot-Wire Chemical Vapor Deposition，大阪，2012年10月8-12日
• 10.　Photovoltaic effect of large-grain polycrystalline silicon films formed by flash lamp annealing，K. Ohdaira and S. Varlamov，22nd international Photovoltaic Science and Engineering Conference，Hangzhou, China，November 5-9, 2012
• 11.　Surface Passivation on Crystalline Silicon with Low Optical Reflectivity and Low Surface Recombination Velocity，H. Matsumura, K. Katoh, K. Koyama, K. Ohdaira，22nd international Photovoltaic Science and Engineering Conference，Hangzhou, China，November 5-9, 2012
• 12.　Study on Stability of SiNx/a-Si Stacked Passivation Layer Realizing Extremely Low Surface Recombination Velocity，T. Goto, K. Koyama, K. Ohdaira, and H. Matsumura，22nd international Photovoltaic Science and Engineering Conference，Hangzhou, China，November 5-9, 2012
• 13.　Low Temperature Doping of P and B atoms into Crystalline Si by Catalytically Generated Species from PH3 and B2H6，T. Ohta, K. Koyama, K. Ohdaira, and H. Matsumura，22nd international Photovoltaic Science and Engineering Conference，Hangzhou, China，November 5-9, 2012
• 14.　Pixel Controlling Substrate Fabricated by Embedding Millions of Silicon IC Chips on Plastic Substrate and Self-Aligned Metal Interconnection Among Such IC Chips，N. T. T. Kieu, T. Yagi, K. Ohdaira, and H. Matsumura，SID International Symposium, Seminar, and Exhibition,，Boston, USA，June 3-8, 2012
• 15.　Formation of high-quality poly-Si films by flash lamp annealing，K. Ohdaira and H. Matsumura，International topical workshop on Subsecond thermal processing of Advanced Materials (subtherm-2011)，Dresden, Germany，October 25-27, 2011
• 16.　Flash-Lamp-Induced Explosive Crystallization of Amorphous Films Leaving Behind Periodic Microstructures，Keisuke Ohdaira and Hideki Matsumura，2011 International Conference on Solid State Devices and Materials (SSDM 2011)，Nagoya, Japan，September 28-30, 2011
• 17.　Impact of Glass Substrates on the Properties of Solar Cells Fabricated Using Flash-Lamp-Crystallized Polycrystalline Silicon Films，K. Ohdaira, S. Ishii, N. Tomura, and H. Matsumura，The 26th European Photovoltaic Solar Energy Conference and Exhibition (26th EU PVSEC)，Hamburg, Germany，5-9 September 2011
• 18.　Mechanism and Control of Crack Generation in Glass Substrates during Crystallization of a-Si Films by Flash Lamp Annealing，Keisuke Ohdaira, Naohito Tomura, Shohei Ishii, Keisuke Sawada, Hideki Matsumura，24th International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 24)，Nara, Japan，21-26 August 2011
• 19.　Reduction in the Defect Density of Flash-Lamp-Crystallized Polycrystalline Silicon Films by Conventional Furnace Annealing，Keisuke Sawada, Shohei Ishii, Naohito Tomura, Keisuke Ohdaira, Hideki Matsumura，24th International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 24)，Nara, Japan，21-26 August 2011
• 20.　Large-Grain Polycrystalline Silicon FilmsFormed Through Flash-Lamp-Induced Explosive Crystallization，Keisuke Ohdaira, Keisuke Sawada, Noritaka Usami, Sergey Varlamov, and Hideki Matsumura，21st International Photovoltaic Science and Engineering Conference (PVSEC-21)，Fukuoka, Japan，November 28 - December 2, 2011

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