Technical Services

JAIST conducts measurements, prototyping, and experiments by using its latest equipment which is hardly available to private or public organizations. JAIST also provides technical training and consultation by utilizing its knowledge.

Consultation

Please contact the Center whose contact information is shown at the bottom of this page. The Center will examine whether JAIST can deal with your request and, if JAIST can, the Center will provide you with detailed procedures.

Expenses

The client has to pay the expenses required for consumables, operation of facilities, travels when JAIST’s staff need to visit the client for guidance. Although the expenses should be prepaid in principle, the payment may be deferred depending on the circumstances.

How to deal with Intellectual Properties

When there are possibilities that intellectual properties such as patents and copyrights will be produced, JAIST and the client make a contract on how to deal with them. If there is no such possibility, the clauses relevant to intellectual properties may be omitted.

Confidentiality

JAIST and the client make an agreement on the mutual confidentiality in advance.
 
The flow of technical services for measurements, prototyping, and experiments by using JAIST’s latest equipment is shown below. For technical guidance and consultation, which follow different flows, please ask our staff at the contact point shown at the bottom of this page.

Features of Technical Services

  1. Expensive and high-precision research facilities, which are only a few in Japan, can be used.
  2. Corporate staff can attend the measurements.
  3. JAIST provides technical services neutrally as a national institute.
  4. All measured data at a corporation’s request belongs to the corporation.
  5. JAIST’s expert staff provides supports from consultation to high-quality measurements. Advices by professors/associate professors are available in some cases.
  6. JAIST provides a wide range of services from requested measurements through prototyping, experiments, technical advices to technical consultation.
  7. Based on the results of the measurements, you can proceed to advanced joint research smoothly.

 

Electron Microscopy and Elemental Analysis
Scanning Electron Microscope
(SEM)
 
製造:日立製作所
装置名:S-4100
分解能:1.5nm (AccV=30kV, WD=5mm)
倍率:40~300,000倍
測定可能元素:Be~U
Scanning Electron Microscope(SEM)
 
製造:日立製作所
装置名:S-5200
分解能:0.5nm(30keV)
加速電圧:0.5~30keV(0.1keVステップ)
倍率:60~2,000,000倍
試料サイズ:5 x 9.5 x 3.5mm
測定可能元素:Be~U
Transmission Electron Microscope (TEM)
 
製造:株式会社日立ハイテクノロジーズ
装置名:H-9000NAR
加速電圧:300kV
フィラメント:LaB6
実用倍率:1万倍~50万倍程度(直接倍率。さらに約5~10倍程度の拡大が可能)
Electron Probe Micro Analyzer(EPMA)

製造:日本電子
装置名:JXA-8900L
二次電子像分解能:6nm (AccV=35kV, WD=11mm)
倍率:40~300,000倍(実用倍率10,000倍程度)
測定可能元素:B~U

Atomic Force Microscope(AFM)

製造:SII社製SPI3800,SPA-400
測定方式:光てこ方式
試料サイズ:最大直径35mmφ、最大厚み10mm
走査範囲:20μm

Elemental Analysis
X-ray Photoelectron Spectrometer(XPS)

製造:Surface Science
Instruments (FISONS-SSI)
装置名:S-Probe
最小プローブ:100μmφ
パスエネルギー:10eV,25eV,50eV,
100eV,150eVの5段階
最大サンプル:3インチ
測定可能元素:Li~U
 

X-ray Photoelectron Spectrometer (XPS)

製造:(株)島津製作所
装置名:KRATOS AXIS-ULTRA DLD
最小プローブ:15μmφ
X線源:MgKa,AlKaMgKa:分析領域φ30μm以下でAd3d5/2,光電子ピーク半値幅0.8eV以下で感度1,100,000cps以上AlKa:分析領域φ30μm以下でAd3d5/2,光電子ピーク半値幅0.48eV以下で感度3,000cps以上測定可能元素:Li~U

Organic Compound Structural Analysis
Nuclear Magnetic Resonance Spectrometer(NMR)

製造:Bruker BioSpin Inc
1.超伝導磁石(UltraShieldPlus型)
磁場強度:18.8 Tesla
磁場ドリフト(ロック時):0.1Hz/1時間 以下
室温ボア内径:54mmФ2.分光計
1)¹H,¹⁹F観測及びデカップリングチャンネル
プロトンの共鳴周波数:800.13MHz
分解能:16ビット
ダイナミックレンジ:96dB(0.002dBステップ)
2)X核観測及びデカップリングチャンネル
X核の共鳴周波数:6~365MHz
分解能:16ビット
ダイナミックレンジ:96dB(0.002dBステップ)
3)Y核観測及びデカップリングチャンネル
Y核の共鳴周波数:6~365MHz
分解能:16ビット
ダイナミックレンジ:96dB(0.002dBステップ)
4)2H核観測及びデカップリングチャンネル
2H核の共鳴周波数:122MHz

Liquid Chromatography Electrospray Ionization Ion Trap Mass Spectrometer (LC-ESI-ITMS)

製造:Thermo Fisher Scientific
装置名:LCQ DECA XP
分解能:約1000
観測質量範囲:m/z 50~2000
イオン化モード:正、負  MSnが可能
使用HPLC:Prominence UFLC (SHIMADZU)

Electronic Material Analysis
AC-2 Photoelectron Spectrometer

製造:理研計器
装置名:光電子分光装置AC-2
サンプル形状:50mm×50mm
(導電性基板)液体、固体、粉末でも可能

Time-Of-Flight Charge Mobility Analyzer

製造:住友重機械アドバンストマシナリー株式会社オプテル部
装置名:TOF-301
光源:窒素レーザー
(波長:337.1nm、パルス幅:600ps)
印加電圧:0-500V
最大シグナル増幅率:1000
倍最少測定間隔:0.5ns

Microscopic Compound Analysis and Organic Compound Structural Analysis
Raman Microspectroscopy System

製造:株式会社東京インスツルメンツ
装置名:Nanofinder30
分解能:
 200nm(3Dイメージ)
 80nm(2Dイメージ)
 50nm(ポイント測定)
サンプル形状(mm):
 50×50×10
 (サンプルはガラス基板上
 でも測定可能)

   
For technical services contact:

Center for Investigation of Advanced Science and Technology

Japan Advanced Institute of Science and Technology
TEL:0761-51-1070
FAX:0761-51-1427
E-mail:ricenter@jaist.ac.jp

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